基于大规模集成电路加工技术介绍具有任意图形编码的二值位相光栅的制作过程。其中包括振幅掩模母版的制作和掩模图形的转移两部分。针对制作的２５×２５扇出的Ｄａｍｍａｎｎ光栅，给出了实测结果，即：扇出点光强的均匀性偏差（以最大相对偏差来衡量）为９．７％，光栅的二维衍射效率为８０．６５％（除去光栅基板对光的两次反射作用），最后分析了制作误差的影响 The fabrication process of binary phase grating with arbitrary pattern code is introduced based on large scale integrated circuit processing technology. Including the production of amplitude mask masters and mask pattern transfer two parts. For the 25 × 25 fan-out Dammann grating produced, the measured results are given, that is: the deviation of the fan’s light intensity is 9.7% (measured by the maximum relative deviation), and the two-dimensional diffraction efficiency of the grating is 80.65% (remove the grating substrate twice the light reflection), and finally analyzed the impact of the production error