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通过耦合波理论分析,使用矩阵转换方法,对全息光刻中全息掩模衍射效率进行数值模拟计算,得出了影响全息掩模衍射特性的因素主要是显影前后记录材料平均介电常数的改变、介质的膨胀与收缩以及非共轭再现等,为实验研究提供了理论依据.
Through the coupling wave theory analysis, the diffraction efficiency of the holographic mask in holographic lithography is calculated by using the matrix conversion method. The factors affecting the diffraction properties of the holographic mask are mainly the change of the average dielectric constant of the recording material before and after developing. Medium expansion and contraction and non-conjugate reproduction, etc., for the experimental study provided a theoretical basis.