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采用MeF3金相显微镜对CVD金刚石膜－硬质合金基体横截面的组织进行了观察，重点研究了甲烷浓度对CVD金刚石膜－基横截面各组织层次的影响。结果表明：硬质合金基体的表面组织发生了显著的变化，形成了不同的组织层次，在化学侵蚀脱钴和等离子体刻蚀脱碳预处理的基础上所沉积的金刚石膜－基横截面组织层次为：金刚石膜／薄的石墨或游离碳层／细小WC层／残留脱碳层（η相十W相）／残留疏松层／YG8基体，甲烷浓度对各层次的形成和厚度有显著的影响。
The microstructure of the cross section of CVD diamond film and cemented carbide substrate was observed by MeF3 metallurgical microscope. The effects of methane concentration on the structure of CVD diamond film and substrate cross section were studied. The results show that the microstructure of the cemented carbide substrate changes significantly, forming different microstructure levels. The diamond film-based cross-section structure deposited on the basis of chemical etching, cobalt removal and plasma etching decarbonization pretreatment The levels are: diamond film / thin graphite or free carbon layer / fine WC layer / residual decarburized layer (η phase and 10 W phase) / residual slack layer / YG8 substrate, the methane concentration has a significant effect on the formation and thickness of each layer .