采用动电位扫描、循环伏安以及电化学交流阻抗等方法研究了铜钴纳米多层膜的电沉积机理．结果表明：在所研究的体系中，铜的沉积是扩散控制的可逆电极过程，而钴的沉积是首先形成Ｃｏ（ＯＨ）ａｄｓ的吸附中间产物，而后在电极上进一步还原为原子态．基于研究结果，提出了铜钴沉积的机制． The electrodepositing mechanism of copper-cobalt nanocomposite films was investigated by potentiodynamic scanning, cyclic voltammetry and electrochemical impedance spectroscopy. The results show that in the system studied, the deposition of copper is a reversible electrode process controlled by diffusion. The deposition of cobalt is the first to form the adsorption intermediate of Co (OH) ads and then further reduced to the atomic state on the electrode. Based on the research results, the mechanism of copper and cobalt deposition was proposed.