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本文描述了Langmiur静电探针测量系统的构成,该系统可用于等离子体特性的诊断。用该系统检测了等离子体沉积Ti薄膜过程中电子密度与电子温度的典型值。实验表明,该系统性能良好,具有强的抗干扰能力,测量精度高、可以应用于真空电弧沉积过程的监控。
This article describes the construction of a Langmiur electrostatic probe measurement system that can be used for the diagnosis of plasma properties. The system was used to examine the typical values of electron density and electron temperature during plasma deposition of Ti thin films. Experiments show that the system has good performance, strong anti-interference ability, high measurement accuracy and can be used in the monitoring of vacuum arc deposition process.