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研究了不同溶胶-凝胶镀膜技术对电致变色WO3薄膜的影响。采用过氧化聚钨酸法配制溶胶,然后通过脉冲电泳沉积和浸渍提拉两种镀膜技术在ITO导电玻璃基底上分别制备WO3薄膜,对比研究了薄膜的微观形貌、结构、光学和电化学性能。结果表明,两种镀膜技术制备的薄膜均为非晶态且厚度相近,约为252 nm;在可见光范围内,脉冲电泳沉积制备的薄膜的光学调制幅度可达80%,比浸渍提拉制备的薄膜高25%;与浸渍提拉法相比,脉冲电泳沉积制备的薄膜具有更高的电化学活性、更快的响应时间和相对低的循环可逆性。
The effects of different sol-gel coating techniques on electrochromic WO3 films were investigated. The sol was prepared by the method of peroxomonosuccinic acid, then the WO3 thin films were prepared on the ITO conductive glass substrate by pulse electrophoresis deposition and dipping and pulling, respectively. The microstructure, optical properties and electrochemical properties of the films were compared. . The results show that the films prepared by the two coating methods are amorphous and have a similar thickness of about 252 nm. Optical modulation of the films prepared by pulse electrophoresis deposition in the visible range can reach 80% The film is 25% higher. Compared with the dip-pull method, the films deposited by pulse electrophoresis have higher electrochemical activity, faster response time and relatively lower cyclic reversibility.