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A 2pm high quality crack-free GaN film was successfully grown on 2-inch Si(111)substrates by metal organic chemical vapor deposition with a high temperature AIN/graded-AIGaN multibuffer and an AIN/GaN superlattice interlayer.It is found that the structures, as well as the thicknesses of the multibuffer and interlayer, are crucial for the growth of a crack-free GaN epilayer.The GaN(0002)XRD FWHM of the crack-free sample is 479.8arcsec, indicating good crystal quality.An AIGaN/GaN heterostructure was grown and tested by Van der Pauw Hall measurement.The electron mobility of two-dimensional electron gas increases from 1928 cm 2/V.S to 12277cm2/V s when the test-temperature decreases from room temperature to liquid nitrogen temperature.The electron mobility is comparable to that of AIGaN/GaN heterostructures grown on sapphire, and the largest value is obtained for an A]GaN/GaN/Si(111)heterostructure grown by metal organic chemical vapor deposition.