光刻工艺是一种复印图象同化学腐蚀相结合的综合性技术。它先采用照相方法把绘制在图纸上的电路图形、拍摄在感光玻璃版上,经过显影、定影、黑化等一系列工序制成照相底版,然后再用感光复印的方法,将照相底版上的电路图形精确地复印在涂有感光胶的铜箔板上,利用光刻胶的保护作用在三氯化铁溶液中,对铜箔版进行选择性化学腐蚀,从而在铜箔板上得到与图纸上完全一致的电路图形。 Photolithography process is a combination of copying images and chemical corrosion of a comprehensive technology. It first uses photographic methods to draw the circuit diagram drawn on the drawings, shot on the photosensitive glass plate, after a series of processes such as developing, fixing, blackening and so on to make a photographic plate, and then use photographic method of copying the photographic plate The circuit pattern is accurately copied on the copper foil coated with photosensitive glue. The protective effect of the photoresist in the ferric chloride solution is used to selectively and chemically etch the copper foil. On the same circuit graphics.