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应用Ｘ射线衍射分析研究了基片负偏压对ＰＥＭＳＩＰ法ＴｉＮ涂层相组成的影响；结果表明，随着基片负偏压增加，膜层相组成朝着富氮相及其含量增加的方向发展，进而影响膜层的硬度。通过微区化学成分分析（ＥＤＳ）研究了膜基界面附近的成分分布。结果表明，界面处有过渡层；偏压愈高，过渡层愈显著。
The influence of substrate negative bias on the phase composition of TiN coating by PEMSIP method was studied by X-ray diffraction analysis. The results showed that the phase composition of the film toward the nitrogen-rich phase and its content increased with the increase of substrate negative bias Development, and thus affect the hardness of the film. The chemical composition analysis (EDS) was used to study the composition distribution near the film-based interface. The results show that there is a transition layer at the interface; the higher the bias voltage, the more significant the transition layer.