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在 1× 10 -6～ 10 -5Pa环境压强下 ,经过高温退火处理 ,在钨针尖上形成了碳化钨薄膜 ,利用场发射显微镜观察到清楚的钨单晶基底上碳化钨薄膜的场发射图像 ;对碳化钨薄膜的场发射I V特性及Fowler Nordheim曲线进行测量和计算 ;用透射电镜测得针尖曲率半径并估算出比例因子 β ,利用Fowler Nordheim公式计算得到碳化钨薄膜的逸出功约为 3 79eV .
At 1 × 10 -6 ~ 10 -5Pa ambient pressure, a tungsten carbide thin film was formed on the tungsten tip after high temperature annealing. The field emission microscope was used to observe the field emission image of the tungsten carbide thin film on the tungsten single crystal substrate. The field emission IV characteristics and the Fowler Nordheim curve of the tungsten carbide film were measured and calculated. The radius of curvature of the needle tip was measured by transmission electron microscopy and the scale factor β was estimated. The Fowler Nordheim formula was used to calculate the work function of the tungsten carbide thin film with a work function of 3 79 eV .