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采用低压等离子体化学气相沉积方法(LPPCVD),结合反弹盘系统制备了微球CH涂层,研究了跳动模式对微球CH涂层表面形貌的影响。利用光学显微镜和扫描电镜(SEM)对微球涂层表面形貌进行了分析;利用原子力显微镜(AFM)测定了微球CH涂层表面均方根粗糙度(RMS)并对球形度进行了表征;利用X光照相技术对同心度进行了表征。结果表明:采用间歇跳动模式可有效改善微球CH涂层的表面形貌,降低中高模数的粗糙度。在间歇跳动模式下,减小占空比,可使CH涂层的表面粗糙度得到进一步降低。在占空比为1/4的间歇跳动模式下制备的厚度为30μm的CH涂层,其表面均方根粗糙度低于30 nm,碳氢-聚苯乙烯(CH-PS)微球的球形度与同心度均优于99%。
The microspheres CH coating was prepared by low pressure plasma chemical vapor deposition (LPPCVD) combined with rebound disk system. The effect of the beating mode on the surface morphology of the microspheres CH coating was investigated. The surface morphology of microspheres was analyzed by optical microscopy and scanning electron microscopy (SEM). The root mean square roughness (RMS) of microspheres CH coatings was measured by atomic force microscopy (AFM) and the sphericity was characterized The concentricity was characterized by X-ray photography. The results show that the intermittent beating mode can effectively improve the surface morphology of the CH coating and reduce the roughness of medium and high modulus. In the intermittent runout mode, reducing the duty cycle, the surface roughness of the CH coating can be further reduced. The average square root roughness of the CH coatings with a thickness of 30μm prepared under the intermittent beat mode of 1/4 duty cycle is less than 30 nm. The spherical shape of the hydrocarbon-polystyrene (CH-PS) microspheres Degree and concentricity are better than 99%.