西班牙巴斯克地区大学电力电子学系G.V.Kurlyandskaya等人采用单辊熔体急冷法制造Fe73.5-x Crx Si13.5B9Nb3Cu1(x=1、2、3)非晶带。常规退火和150MPa单位荷重下在520℃退火2h都导致形成纳米晶结构,其平均尺寸为13nm。研究表明,所研究的所有试样晶粒尺寸差别都不大。晶体取向基本上是各向同性的,表明所有试样都未形成织构。所有常规退火非 G.V. Kurlyandskaya et al., Department of Power Electronics, University of Basque Country, Spain, used a single roll melt quenching process to fabricate Fe73.5-x CrxSi13.5B9Nb3Cu1 (x = 1,2,3) amorphous ribbons. Conventional annealing and annealing at 520 ° C for 2 h under a 150 MPa unit load resulted in the formation of nanocrystalline structures with an average size of 13 nm. The study shows that the grain size of all the studied samples is not very different. The crystal orientation is essentially isotropic, indicating that no texture is formed on all specimens. All conventional annealing non