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表面等离子体激元(surface Plasmon polaritons,SPPs)与光场之间相互作用能够实现对光传播的主动操控,从而可以应用于SPPs元器件的制作,表面等离子体光子芯片的制造,突破衍射极限的超分辨成像,SPPs纳米光刻蚀术等领域。本此研究过程中,我以表面等离子体光子学原理为基础,对以硅片为载体的表面等离子体光刻技术进行了初步的研究,对光刻时入射角度的选择进行了分析,得到了寻找最佳入射角的基本方法。并通过实验得到了线宽为微米级光刻图像。
The interaction between surface plasmon polaritons (SPPs) and the light field can realize the active control of light propagation, which can be used in the fabrication of SPPs components, the fabrication of surface plasmon photonic chips, the breakthrough of the diffraction limit Super-resolution imaging, SPPs nano-lithography and other fields. In the course of this research, based on the surface plasmon photon principle, I conducted a preliminary study on the surface plasmon photolithography technology using silicon as a carrier, and analyzed the choice of the angle of incidence during lithography. The basic method to find the best angle of incidence. The experimental results show that the linewidth is micrometer lithography.