软刻蚀是通过表面带图案的弹性模板来实现图案的转移的图形复制技术,作为非光刻微米和纳米量级微加工方法,加工的分辨率可以达到5nm100μm,它克服了传统光刻技术的缺陷,为形成和制作平面和曲面上的微米和纳米图案提供了简便、有效的低成本途径。本文将主要介绍微接触印刷、近场光刻蚀、纳米压印等软刻蚀方法的原理、方法以及面临的问题,并简介了它们在微米和纳米加工、微电子学、材料科学、光学、微电子机械系统、表面化学等方面应用。 Soft etching is the pattern replication technology that transfers the pattern through the surface patterned flexible template. As a non-lithographic and nano-scale micro-machining method, the processing resolution can reach 5nm100μm, which overcomes the traditional lithography Defects provide a simple, cost-effective and cost-effective way to form and fabricate micrometer and nanometer patterns on both planar and curved surfaces. This article will mainly introduce the principles, methods and problems of soft etching methods such as micro-contact printing, near-field photolithography and nanoimprinting, and introduce their applications in micro and nano fabrication, microelectronics, materials science, optics, Microelectromechanical systems, surface chemistry applications.