论文部分内容阅读
采用高功率脉冲磁控放电等离子体离子注入与沉积的方法在不锈钢基体上制备了高膜基结合力的CrN硬质薄膜,并研究了不同的Ar/N流量比对薄膜形貌、结构及性能的影响。采用扫描电子显微镜、X射线衍射对其表面形貌和结构进行分析,发现制备的薄膜表面光滑、致密,相结构单一,主要是CrN(200)相。对薄膜的结合力、硬度、弹性模量、耐磨性和耐腐蚀性的测试分析表明:薄膜与基体之间有很好的结合力,临界载荷最高可达68 N,同时硬度、弹性模量、耐磨性及耐腐蚀性都有很大提高,其中硬度最高达到23.6 GPa,是基体硬度的4.7倍,摩擦系数为0.5左右,且磨痕较窄、较浅,腐蚀电位最高提高0.32 V,腐蚀电流下降1~2个数量级。
CrN hard films with high film-based bond strength were prepared on stainless steel substrate by high-power pulsed magnetron discharge plasma ion implantation and deposition. The effects of different Ar / N ratio on the morphology, structure and properties of the films Impact. The surface morphology and structure of the prepared films were analyzed by scanning electron microscopy and X-ray diffraction. The results show that the prepared films have a smooth and dense surface and a single phase structure, mainly CrN (200) phase. The test results of film adhesion, hardness, elastic modulus, abrasion resistance and corrosion resistance show that there is a good binding force between the film and the substrate, the critical load up to 68 N, while the hardness, elastic modulus , Wear resistance and corrosion resistance have greatly improved, of which the highest hardness of 23.6 GPa, 4.7 times the substrate hardness, the friction coefficient of about 0.5, and the narrow wear scar, shallow, the highest corrosion potential increased 0.32 V, Corrosion current decreased by 1 to 2 orders of magnitude.