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采用室温磁控溅射技术在纳米晶体钛(剧烈塑性变形制备)表面制备出碳化硅(SiC)薄膜,研究了SiC薄膜在高载荷下的摩擦磨损性能。结果表明:在1000g载荷(Hertzian接触应力约为1170MPa)、室温、Kokubo人体模拟体液条件下,与氮化硅(Si3N4)球(半径为2mm)对摩时,SiC薄膜具有良好的耐摩擦磨损性能,其摩擦系数约为0.184,磨损速率为4.18×10-6mm3·m-1N-1,磨损表面未出现薄膜剥落现象。本SiC薄膜在高载荷下所表现出的良好耐摩擦磨损性能是由于其膜-基之间具有好的弹性模量匹配、薄膜自身具有高的塑性、薄膜与基材的硬度都较低(有助于降低摩擦磨损时的实际接触应力),薄膜自身具有较高的硬度与弹性模量的比值。
The silicon carbide (SiC) thin films were prepared on the surface of nanocrystalline titanium (severe plastic deformation) by room temperature magnetron sputtering. The friction and wear properties of SiC thin films under high load were studied. The results show that the SiC films have good wear and abrasion resistance under 1000g load (Hertzian contact stress is about 1170MPa), room temperature and Kokubo human body simulated body fluids, and silicon nitride (Si3N4) spheres (radius is 2mm) , The coefficient of friction is about 0.184, the wear rate is 4.18 × 10-6mm3 · m-1N-1, and no flaking occurs on the worn surface. The SiC film exhibits good abrasion resistance under high load due to its good elastic modulus matching between the film and the substrate, high self-plasticity of the film itself and low hardness of the film and the substrate Help to reduce the actual contact stress when the friction and wear), the film itself has a higher ratio of hardness and elastic modulus.