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多数 ITO透明导电玻璃生产线在实现 Si O2 膜与 ITO膜在线联镀时 ,应用 Si O2 靶射频溅射沉积 Si O2膜工艺和 ITO靶直流溅射沉积 ITO膜工艺 ,如果 Si O2 膜应用硅靶反应磁控溅射工艺 ,存在这种工艺是否可以与 ITO靶直流溅射沉积 ITO膜工艺在线联用以及如何实现联用的问题。作者对现有的生产线进行了改造设计、加工 ,做了大量实验、质谱分析和多项测试研究 ,成功地实现反应溅射 Si O2 膜与 ITO膜在线联镀 ,做到Si O2 镀膜室的工作状态的变化基本上不影响 ITO镀膜室的工艺条件
Most ITO transparent conductive glass production line in the realization of Si O2 film and ITO film online plating, the application of Si O2 target RF sputter deposition of Si O2 film and ITO target DC sputtering deposition of ITO film process, Si O2 film if the application of silicon target reaction Magnetron sputtering process, there is such a process can be ITO target DC sputtering deposition of ITO film online process and how to achieve the joint problem. The author has reformed the existing production line design, processing, a large number of experiments, mass spectrometry analysis and a number of test studies, the successful realization of reactive sputtering Si O2 film and ITO film online plating, so Si O2 coating chamber work The change of state does not affect the process conditions of ITO coating room basically