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采用电子背散射衍射(EBSD)和扫描电镜(SEM)等技术研究了再结晶态黄铜H80轧制退火过程中的晶界特征分布(GBCD)与脱溶分解。结果表明:小变形后的H80在低温退火中,随退火时间增加∑3n(n=1,2,3)特殊晶界比例(fSBs)先增后减,当退火时间达到48h时,fSBs达到峰值76%,互成∑3n(n=1,2,3)界面关系的特殊晶粒团平均尺寸超过100μm,并且特殊晶界较好地阻断了一般大角晶界网络的连通性。继续延长退火时间到72h,则发生不连续脱溶转变。脱溶相与基体之间呈一般大角度界面关系,导致特殊晶界比例降低至50%以下,并且特殊晶粒团平均尺寸减小至约20μm。
The grain boundary characteristic distribution (GBCD) and desolvation of the recrystallized brass H80 rolling annealing process were studied by electron backscatter diffraction (EBSD) and scanning electron microscopy (SEM). The results show that the specific grain boundary fraction (fSBs) of Σ3n (n = 1, 2, 3) increased first and then decreased with the increase of annealing time at low temperature annealing. When the annealing time reached 48h, the peak value of fSBs 76%. The average size of the special grains with the interfacial Σ3n (n = 1,2,3) interface exceeds 100μm, and the special grain boundaries can well block the connectivity of the general large-angle grain boundary network. Continue to extend the annealing time to 72h, then the occurrence of discontinuous dissolution transformation. There is a generally large-angle interface between the desolvating phase and the matrix, resulting in a reduction of the specific grain boundary ratio below 50% and the average size of the special grain clusters to about 20 μm.