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本文叙述和讨论了一种方法,根据这种方法,可以在生产过程中从多层膜的透射系数测定中,确定电介质薄膜的折射率,按这种方法获得 CaF_2,Na_3A1F_6,MgF_2,ThF_4,PbF_2,Sb_2O_3,ZnS 和 ZnSe(这些材料的各种组合)的折射率。结果,与文献中所给出的数值基本一致。只有在极疏松的基膜上(如在 CaF_2薄膜)所淀积的膜层,折射率明显地偏小.由此可以推断,从底层向表层存在一定疏松度的过渡.
This paper describes and discusses a method by which the refractive index of a dielectric thin film can be determined from the transmission coefficient of a multilayer film in the production process. The refractive index of the dielectric film can be determined by this method. The CaF 2, Na 3 Al 3 F 6, MgF 2, ThF 4, PbF 2 , Sb 2 O 3, ZnS, and ZnSe (various combinations of these materials). The result is basically the same as that given in the literature. Only in the very loose base film (such as CaF 2 film) deposited film layer, the refractive index was significantly lower, from which we can infer that from the bottom to the surface there is a certain degree of porosity transition.