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室温下,在Sr(OH)2溶液中采用原电池方法直接制备了高晶态SrMoO4薄膜.通过XRD和SEM技术系统探讨了反应时间、溶液pH值和外加氧化剂等工艺条件对制备的SrMoO4薄膜的结晶性和表面形貌的影响.结果表明,电化学反应时间、溶液pH值和外加氧化剂对SrMoO4薄膜的晶体结构和表面形貌具有重要的影响:随着反应时间的增加,薄膜的结晶性和形貌会改善;在较高的溶液pH值条件下,SrMoO4晶粒沿c轴择优生长;当加入适量的过氧化氢氧化剂时,可加快SrMoO4晶粒的生长,但会产生团聚现象.
High-SrMoO4 thin films were prepared directly from Sr (OH) 2 solution at room temperature by means of galvanic cell method.The reaction conditions such as reaction time, solution pH and the addition of oxidant were systematically investigated by XRD and SEM techniques. Crystallinity and surface morphology of SrMoO4 thin films were investigated.The results showed that the electrochemical reaction time, pH value of the solution and the addition of oxidant had an important effect on the crystal structure and surface morphology of SrMoO4 thin films: with the increase of reaction time, The morphology of SrMoO4 crystal grows favorably along the c-axis at higher solution pH. When an appropriate amount of hydrogen peroxide oxidant is added, the growth of SrMoO4 crystal can be accelerated, but agglomeration may occur.