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一、前言 Greenfield等所使用的高功率(4—15千瓦)、低频率(7兆赫)N_2—Ar ICP和Fassel、Boumans所使用的低功率(0.5—2.5千瓦)、高频率(27—50兆赫)的Ar ICP是当今发射光谱分析用的电感耦合高频等离子体的两大类型,这两类ICP都具有良好的分析性能,并已广泛应用于分析工作。但从气体的消耗量和分析设备的成本来看,前者通常消耗N_2 20—70升/分,Ar 10—35升/分,且高功率发生器结构复杂,成本较高;而后者仅消耗Ar 10—20升/分,似乎更可取一些。
I. INTRODUCTION The low power (0.5-2.5 kilowatts), high frequency (27-50 megahertz), high power (4-15 kW), low frequency (7 megahertz) N_2-Ar ICP and Fassel used by Greenfield et al. ) Ar ICP is the two major types of inductively coupled high frequency plasma for today’s emission spectroscopy, both of which have good analytical performance and are widely used in analytical work. However, from the gas consumption and analysis of equipment costs, the former usually consume N20 20-70 liters / min, Ar 10-35 liters / min, and high-power generator structure is complex and costly; the latter consumes only Ar 10-20 l / min, it seems more desirable.