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设计了大面积循环扫描投影光刻的高精度对准系统,由CCD传感器、图像识别软件和共焦显微镜组成的光学测量系统和对掩模和基片的相对位置作二维和角度及时修正的精密定位系统两部分组成。标记图像的二维方向扫描分别借助光刻平台的移动和振镜的高频振动来完成。理论分析了标记位矢对准、共焦成像和CCD信号相关双采样关键技术。根据掩模和基片对应位矢的夹角余弦值大小控制基片的旋转和平动,对准更方便快捷;由共焦成像系统二维响应函数的推算,针孔滤波对提高成像分辨率很重要;对CCD像元电荷包实时准确地采样,是排除噪声干扰的关键。
A high-precision alignment system for large-area cyclic scanning projection lithography is designed. An optical measuring system composed of CCD sensor, image recognition software and confocal microscope and a two-dimensional and angular correction of the relative positions of the mask and the substrate are performed Precision positioning system consists of two parts. The two-dimensional scanning of the mark image is performed by means of the movement of the photolithography platform and the dithering of the galvanometer respectively. Theoretical analysis of the key bit-vector alignment, confocal imaging and CCD signal correlated double sampling key technologies. It is more convenient and faster to control the rotation and translation of the substrate according to the cosine of the included angle between the mask and the substrate. According to the two-dimensional response function of the confocal imaging system, the pinhole filtering is very effective in improving the imaging resolution Important; real-time accurate sampling of CCD pixel charge packets, is the key to exclude noise interference.