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1.荷兰Delft大学应用物理系目前正在研制一种新型电子束曝光机,它的主要技术指标是:图形最小线宽为0.5μm,分辨率为0.1μm,生产率为每小时可曝光4英寸圆片100片,这是目前已知的生产率最高的一种机型。 在一般电子束曝光机中,提高曝光速度必须增大束流,但束流增大以后,电子之间的相互斥力增大,又会影响图形分辩率。为了解决这个矛盾,Delft大学将从电子源引
1.Department of Applied Physics, Delft University, the Netherlands is currently developing a new type of electron beam exposure machine, its main technical indicators are: minimum line width of 0.5μm graphics, resolution of 0.1μm, the productivity of 4-inch wafer per hour exposure 100 pieces, which is the most productive model known to date. In a general electron beam exposure machine, it is necessary to increase the beam speed for increasing the exposure speed. However, when the beam current increases, the mutual repulsion between the electrons increases, which in turn affects the resolution of the picture. In order to solve this contradiction, Delft University will lead from the electron source