自量子阱混杂发现以来,其在这几十年的发展中取得了巨大进步。在各种量子阱混杂的方法中,无杂质空位扩散诱导量子阱混杂(IFVD)以其独特的优势获得了细致的研究和广泛的应用。主要从混杂原理、介质膜类型、材料系、低维量子点中的应用和器件应用等几个方面来全面分析IFVD研究和应用现状。 Since the discovery of quantum well hybrids, it has made great strides in these decades of development. In a variety of quantum well hybridization methods, impurity-free interstitial diffusion-induced quantum well hybrid (IFVD) has meticulous research and extensive application due to its unique advantages. Mainly from the hybrid principle, the type of dielectric film, the material system, the application of low-dimensional quantum dots and device applications several aspects to fully analyze the IFVD research and application status.