论文部分内容阅读
采用电子束蒸发沉积技术制备了平板偏振膜。用Lambda900分光光度计测试了其光学性能。在中心波长1053 nm处P偏振光的透过率TP>98%,S偏振光的透过率TS<0.5%,消光比TP/TS>200∶1,带宽约为20 nm。用波长1064 nm,脉宽12 ns的脉冲激光进行损伤阈值测试,获得P偏振光的损伤阈值为17.2 J/cm2,S偏振光的损伤阈值为19.6 J/cm2。用Nomarski显微镜对薄膜的损伤形貌进行观察,并用Alpha-500型台阶仪对损伤深度进行测试。结果表明,P偏振光的激光损伤为界面损伤与缺陷损伤,而S偏振光的激光损伤主要是驻波电场引起的界面损伤,界面损伤发生在偏振膜表面第一层与第二层界面处,缺陷损伤发生在偏振膜内部。
Flat polarizer was prepared by electron beam evaporation deposition. The optical properties were tested with a Lambda 900 spectrophotometer. P-polarized light transmittance TP> 98% at center wavelength 1053 nm, S-polarized light transmittance TS <0.5%, extinction ratio TP / TS> 200: 1 and bandwidth about 20 nm. The damage threshold of pulsed laser with wavelength of 1064 nm and pulse width of 12 ns was tested, and the damage threshold of P-polarized light was 17.2 J / cm 2 and that of S-polarized light was 19.6 J / cm 2. The damage morphology of the film was observed with Nomarski microscope and the depth of damage was tested with Alpha-500 stepper. The results show that the laser damage of P polarized light is the interface damage and defect damage, while the laser damage of S polarized light is mainly caused by the standing wave electric field. The interface damage occurs at the interface of the first layer and the second layer of the polarizing film, Defect damage occurs inside the polarizing film.