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在发展流动亚相法制备高粘度聚合物分子单层膜装置的基础上，研究制备大面积、高质量的PMMALB膜抗蚀层，并用于100mmCr掩模版的电子束光刻制造技术中，采用现行标准的湿法工艺获得了分辨率为0．5μm，特征线宽为0．3μm的高分辨率100mm铬掩模版。为深亚微米掩模版制造的研究探索了一条新路。
Based on the development of mobile monolithic high viscosity polymer molecular monolayer device, a large area, high quality PMMALB film resist was developed and used in electron beam lithography technology of 100mmCr reticle. A standard high-resolution 100mm chromium reticle with a resolution of 0.5μm and a characteristic linewidth of 0.3μm was obtained using a standard wet process. A new road has been explored for the study of deep submicron reticle manufacturing.