硅的电抛光制备的硅衬底适合用作硅外延,因此引起了人们对这种工艺的兴趣。硅的电抛光又叫电解抛光,它是硅片置入电解槽中,硅片作阳极电解,达到抛光目的。过去已对硅电抛光的电解液有过一些报导,例如,1.在氢氟酸水溶液中一般不能电抛光硅,但后来发现,电流密度超过一定临界值仍可抛光。2.采用有机的羟基化合物作电解液,如酒精、乙二醇、甘油等。3.在第二种方法中,即在有机羟基化合物中,再按10％容积比的量加入50％氢氟酸,这样的电解液,当电流密度超过800毫安/厘米~2时,可以得到满意的抛光结果。4.在每升甘油中加66克的氟化氢铵作电解液,电流密度800毫 Silicone electropolished silicon substrates are suitable for use as epitaxial silicon and therefore have attracted interest in this process. Silicon electropolishing also known as electrolytic polishing, it is the silicon into the cell, the silicon anode electrolysis, to achieve the purpose of polishing. In the past, there have been some reports on electrolytically polished silicon, for example, 1. Electro-polishing of silicon in hydrofluoric acid solution is generally not possible, but later it was found that the current density was still polished beyond a certain critical value. 2. The use of organic hydroxy compounds as electrolyte, such as alcohol, ethylene glycol, glycerol and so on. 3. In the second method, 50% hydrofluoric acid is added to the organic hydroxy compound in a volume ratio of 10%. Such an electrolyte, when the current density exceeds 800 mA / cm2, can be Satisfactory results of the polishing. 4. Add 66g of ammonium bifluoride per liter of glycerol as the electrolyte, the current density of 800 milliliters