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用低压化学气相沉积法制备TiO2薄膜.研究表明,水的分压、沉积温度、基片材料均对沉积速率有影响.在硅片上镀膜,沉积温度相同而退火温度不同,则薄膜结构亦不同.当退火温度高于85℃时,薄膜为纯金红石薄膜.
制备条件对二氧化钛薄膜性能的影响
【摘 要】
：
用低压化学气相沉积法制备TiO2薄膜.研究表明,水的分压、沉积温度、基片材料均对沉积速率有影响.在硅片上镀膜,沉积温度相同而退火温度不同,则薄膜结构亦不同.当退火温度高于
【机 构】
：
太原理工大学化学工程与技术学院
【出 处】
：
天然气化学
【发表日期】
：
2004年期
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