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利用脉冲偏压磁过滤电弧离子镀在高速钢(M2)基底上沉积了厚约2.5μm的TiN薄膜;分别采用FESEM、GDOES、XRD和划痕试验法观察薄膜表面和断面形貌、测试薄膜成分及相结构,分析膜基结合强度,通过显微硬度计和球盘摩擦磨损试验机对比考察TiN薄膜和M2高速钢基体的硬度和耐磨性。结果表明,TiN薄膜表面光滑致密,呈现致密柱状晶结构和明显的(111)择优取向,膜基结合强度大于60 N,薄膜硬度约为26 GPa;脉冲偏压磁过滤电弧离子镀制备的TiN薄膜表现出很好的减摩和耐磨性能。
The TiN thin films with a thickness of about 2.5μm were deposited on the high speed steel (M2) substrate by pulsed bias magnetic arc ion plating. The surface and cross section of the films were observed by FESEM, GDOES, XRD and scratch test, respectively. And phase structure, the film-based bonding strength was analyzed. The hardness and wear resistance of TiN film and M2 high speed steel substrate were compared by micro-hardness tester and ball-and-disk friction and wear tester. The results show that the surface of TiN thin film is smooth and dense, showing a dense columnar crystal structure and obvious preferential orientation of (111). The bonding strength of the film is greater than 60 N and the hardness of the film is about 26 GPa. The TiN film prepared by pulsed bias magnetic arc ion plating Exhibits good friction and wear resistance.