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在硫酸盐水溶液中制备钴金属,研究四乙基溴化铵作为添加剂对其结构和形貌特征的影响。根据四乙基溴化铵的浓度变化(范围为1~50 mg/L)来评价其对电沉积金属钴的电流效率、能量消耗和电沉积质量的影响。当四乙基溴化铵的浓度为10 mg/L,且电流效率为99.6%、能量消耗为2.38 k W·h/kg时,可以得到平整且光亮的钴沉淀。X射线衍射分析表明,在钴电沉淀过程中,(100)面是晶体生长的择优生长面。扫描电镜结果表明,当四乙基溴化铵的浓度为10 mg/L时,可获得平整均匀的钴沉淀,而浓度超过10 mg/L时,沉淀质量恶化。循环伏安法研究表明,在电解槽中加入四乙基溴化铵时,阴极产生极化且阴极电流大大降低。XPS结果证实电沉积可获得高纯钴,且FTIR谱证明沉淀中没有与四乙基溴化铵结合的成分。
Cobalt metal was prepared in aqueous sulfate solution to study the effect of tetraethylammonium bromide as additive on its structure and morphology. The effect of tetraethylammonium bromide on the current efficiency, energy consumption and electrodeposition quality of the electrodeposited metallic cobalt was evaluated based on the concentration of tetraethylammonium bromide (range 1 to 50 mg / L). When the concentration of tetraethylammonium bromide is 10 mg / L, the current efficiency is 99.6% and the energy consumption is 2.38 kW · h / kg, a smooth and bright cobalt precipitate can be obtained. X-ray diffraction analysis shows that (100) plane is the preferred growth plane for crystal growth during cobalt electrodeposition. Scanning electron microscopy results showed that when the concentration of tetraethylammonium bromide was 10 mg / L, a uniform and uniform cobalt precipitate was obtained, while at a concentration of more than 10 mg / L, the precipitation quality was deteriorated. Cyclic voltammetry studies have shown that when tetraethylammonium bromide is added to the cell, the cathode is polarized and the cathode current is greatly reduced. The XPS results confirmed that electrodepositing yielded highly pure cobalt, and the FTIR spectra demonstrated that there was no component of the precipitate bound to tetraethylammonium bromide.