论文部分内容阅读
采用磁控溅射法,以溅射气压为变量,在ITO导电玻璃上制备了WO3薄膜及TiO2薄膜,将Li+聚合物电解质涂覆于这两种薄膜之间封装成固态电致变色器件。采用XRD、AFM对WO3薄膜进行结构表征和形貌观察;采用直流稳压电源对器件进行电致变色测试,并以分光光度计测定其着色/褪色态可见光透过率。结果表明:1.5Pa溅射气压下原位沉积WO3薄膜含较多的金属W;2.0~3.0Pa溅射气压下得到了非晶态WO3薄膜;2.0Pa溅射气压下得到的WO3薄膜表面分布有狭长的颗粒团簇,表面积较大,便于着色或褪色时Li+与电子的注入或脱出,故其所封装器件的调制幅度最大,响应最快;随溅射气压的增大,WO3薄膜表面缺陷增多,器件变色性能恶化。
Using magnetron sputtering method and sputtering pressure as variables, WO3 thin films and TiO2 thin films were prepared on ITO conductive glass. The Li + polymer electrolyte was coated between these two thin films and encapsulated into solid state electrochromic devices. The structure and morphology of the WO3 thin films were characterized by XRD and AFM. The device was electrochromic tested by DC power supply. The visible light transmittance of the colored / faded state was measured by spectrophotometer. The results show that WO3 thin films contain more metal W deposited at 1.5Pa sputtering pressure and WO3 thin films at 2.0 ~ 3.0Pa sputtering pressure. The surface distribution of WO3 thin films obtained under 2.0Pa sputtering pressure is Narrow and long-sized particle clusters with larger surface area facilitate the injection or ejection of Li + and electrons when colored or faded, so the modulation range of the packaged devices is the largest and the response is fastest. With the increase of sputtering pressure, the surface defects of WO3 thin films increase , Device color deterioration.