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Nikon Corp.在2006年Semicon Japan贸易展中宣布其193nm ArF浸没式光刻系统NSR-S610C的成像性能已达到了39nm L/S(line/space),数值孔径高达1.3。Nikon计划2007年早些时候开始批量生产S610系列,以用于45nm产品的生产和39nm技术的开发。用于展示的39nm L/S图形由S610采用NikonPo
Nikon Corp. announced at the Semicon Japan trade show in 2006 that its 193nm ArF immersion lithography system NSR-S610C has reached an imaging performance of 39nm L / S (line / space) with a numerical aperture up to 1.3. Nikon plans to begin volume production of the S610 series earlier in 2007 for the production of 45nm products and the development of 39nm technology. 39nm L / S graphics for display NikonPo by S610