电子束光刻亚微米矩形阵列的坡莫合金薄膜铁磁共振谱的研究

来源 :东南大学学报 | 被引量 : 0次 | 上传用户:tony_yang
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报告了对电子束刻蚀的亚微米矩形阵列坡莫合金NiFe薄膜系统的铁磁共振(FMR)研究及对矩形阵列不均匀退磁场和铁磁共振谱进行的理论拟合.计算出样品的有效磁化强度M,回旋磁比γ以及兰德因子g等参数,并且得出了共振场与所加磁场方位关系的理论曲线.结果与实验曲线一致.研究证明矩形单元导致了单轴平面磁各向异性.本文还发现了在外磁场加在垂直于膜面的方向时,在主共振峰的低场侧出现了一系列规则的卫星峰,并对这一系列的子峰出现可能的机制进行了探讨.
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