,Structural properties of polycrystalline silicon films formed by pulsed rapid thermal processing

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A novel pulsed rapid thermal processing (PRTP) method has been used for realizing solid-phase crystallizationof amorphous silicon films prepared by plasma-enhanced chemical vapour deposition. The microstructure and surfacemorphology of the crystallized films were investigated using x-ray diffraction and atomic force microscopy. The resultsindicate that PRTP is a suitable post-crystallization technique for fabricating large-area polycrystalline silicon films withgood structural quality, such as large grain size, small lattice microstrain and smooth surface morphology on low-costglass substrates.
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