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美国应用材料公司宣布了其突破性的Applied Producer Eterna FCVD(流体化学气相沉积)系统。这是首创的也是唯一的以高质量介电薄膜隔离20纳米及以下存储器和逻辑器件中的高密度晶体管的薄膜沉积技术。这些隔离区域可以形成深宽比大于30(是当今需求的5倍)和高度复杂的形貌。Eter
Applied Materials Corporation announced the groundbreaking Applied Producer Eterna FCVD (Fluid Chemical Vapor Deposition) system. This is the first and only thin film deposition technology to isolate high-density transistors in memories and logic devices up to 20 nanometers and below with high-quality dielectric films. These isolated areas can form highly complex shapes with aspect ratios greater than 30 (five times greater than today’s needs). Eter