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在不同的沉积温度下,用热蒸发方法在熔融石英(JGS1)上制备了LaF3单层薄膜。分别采用分光光度计测量了薄膜样品的透射率和反射率光谱,反演得出薄膜的折射率和消光系数;采用原子力显微镜(AFM)观察了样品的表面形貌,并通过表面粗糙度计算得出总积分散射损耗;采用X射线衍射仪(XRD)测试了薄膜的晶体结构,由衍射谱图拟合得到衍射峰的半峰全宽,进而计算出薄膜晶粒的平均尺寸。实验结果表明,随着沉积温度的升高,LaF3薄膜的结晶状况明显变好,晶粒尺寸逐渐变大,膜层变得更加致密,薄膜的光学常数和折射率不均匀性均呈线性变化。沉积温度的增加对薄膜表面粗糙度的影响不明显,散射损耗在光学损耗中所占比例较小,所以光学损耗的变化主要由吸收损耗引起。
LaF3 monolayers were prepared on fused quartz (JGS1) by thermal evaporation at different deposition temperatures. The transmittance and reflectance spectra of the films were measured by spectrophotometer, and the refractive index and extinction coefficient of the films were obtained by inversion. The surface morphology of the samples was observed by atomic force microscope (AFM), and the surface roughness was calculated by surface roughness The total integral scattering loss was obtained. The crystal structure of the film was tested by X-ray diffraction (XRD), and the full width at half maximum of the diffraction peak was obtained by the diffraction spectrum fitting. The average grain size of the film was calculated. The experimental results show that with the increase of deposition temperature, the crystallinity of LaF3 thin film becomes better and the grain size becomes larger and the film becomes denser. The optical constants and refractive index nonuniformity of the films change linearly. The increase of deposition temperature has no obvious effect on the surface roughness of the film, and the scattering loss accounts for a small proportion of the optical loss. Therefore, the change of optical loss is mainly caused by the absorption loss.