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为防止硼、硅的损失,将六氟化铀样品在氨水中进行水解,并在低于100℃下蒸干,用光谱法测定其中的硼、硅含量。采用交流电弧进行光谱激发,使用中型石英摄谱仪作为分光系统。针对上述设备选择了电流、电极形状等工作参数。方法的用样量小于100mg(一条谱的用量为20 mg);单次测量标准偏差为9—25%;回收率在83—105%的范围内;硼和硅的测定下限分别为0.8和10 ppm。硅的测定下限受基体中本底含量的限制。
In order to prevent boron and silicon loss, uranium hexafluoride samples were hydrolyzed in aqueous ammonia and evaporated to dryness at less than 100 ° C. The contents of boron and silicon were determined spectrographically. Spectral excitation using an AC arc, using a medium-sized quartz spectrometer as a spectroscopic system. For the above equipment selected current, electrode shape and other operating parameters. The method of sample size is less than 100mg (a spectrum of 20 mg); single measurement standard deviation of 9-25%; recovery in the range of 83-105%; the lower limit of determination of boron and silicon were 0.8 and 10 ppm. The lower limit of determination by the background of silicon content in the substrate.