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针对薄膜及镀层织构分析的特殊困难（衍射峰特宽、强度测量偶然误差严重、散焦补正困难等），基于熵最大与极密度差最小二乘优化应同步进行的原则，提出了织构分析中熵最大处理模式的新的约束条件，修正了以往约束条件与取向非负性之间的不自洽性［１］，从而克服了薄膜织构定量分析的困难．模拟研究表明：新方法可以自动补偿测量偶然误差及散焦误差、应用实例指出，此法可成功进行实际镀层材料的织构定量分析。
In view of the special difficulties in the texture analysis of thin films and coatings (the special diffraction peak, the occasional error of intensity measurement and the difficulty of defocus correction), based on the principle that the entropy maximum and least density difference least squares optimization should be carried out synchronously, This paper analyzes the new constraint condition of the maximum entropy processing mode and modifies the inconsistency between the previous constraint conditions and the non-negative orientation [1], thus overcoming the difficulty of the quantitative analysis of the thin film texture. The simulation results show that the new method can automatically compensate for the accidental errors and the defocus errors. The application examples show that this method can successfully carry out the quantitative analysis of the texture of the actual coating.