在市售负载闭锁成盒自动反应离子腐蚀设备中,作了硅与铜和铝的合金的均匀可重复定向腐蚀。用一种使用BCl_3、Cl_2多元腐蚀混合物的自动、连续两步工艺产生清洁的各向异性的腐蚀图形,其质量和在恰当的光致抗蚀腐蚀速率下,对SiO_2的选择腐蚀一样好。 In the commercial load lock into a box of automatic reactive ion etching equipment, made of silicon and copper and aluminum alloy uniform repeatable orientation corrosion. A clean, anisotropic etch pattern is produced using an automated, continuous two-step process using a BCl 3, Cl 2 multi-element etch mixture with the same quality and selective etch of SiO 2 at the proper etch rate.