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使用多靶离子束溅射沉积方法制备出Ag/Si多层膜 .利用原位低角X射线衍射技术和截面高分辨透射电子显微镜观察 5 0～ 30 0℃退火过程中Ag/Si多层膜各亚层间发生的扩散现象 ,并由此分析研究Ag/Si多层膜微观结构变化 ,即Ag/Si纳米颗粒多层膜的形成过程 .计算出Si在Ag亚层中的扩散激活能和频率因子分别为 0 .2 4eV和 2 .0 2× 1 0 -2 0 m2 /s,纳米Ag颗粒的尺寸约为 5nm .
Multi-target ion-beam sputtering deposition was used to fabricate Ag / Si multilayers. In-situ low angle X-ray diffraction and cross-sectional high resolution transmission electron microscopy were used to observe the Ag / Si multilayers The diffusion of Ag / Si multilayer films, that is, the formation process of Ag / Si nanoparticle multilayer films, was analyzed and the diffusion activation energy of Si in Ag sublayers was calculated. The frequency factors are 0.24eV and 2.02 × 10-2m2 / s, respectively. The size of nano-Ag particles is about 5nm.