本文介绍了一种制备 SnO_2膜的新方法—化学超声喷雾淀积(CSD)技术.为制得高质量的 SnO_2膜,我们对各种淀积参数进行了详细的研究.通过 X 光衍射仪、扫描电子显微镜的分析和膜厚的测量,研究了 SnO_2膜的形貌和晶体结构,结果表明喷嘴到衬底的距离、淀积时间和喷雾的雾量大小对膜的淀积影响最大,衬底位置及热处理的时间也都会影响膜的粒径、均匀性和致密性.此外,结果还表明淀积时间较短的 SnO_2膜,经过热处理后,晶形有明显的改善. In this paper, we introduce a new method of preparing SnO_2 film-Chemical Ultrasonic Spray Deposition (CSD) technology.In order to obtain high-quality SnO_2 film, we have studied various deposition parameters in detail.According to X-ray diffractometer, Scanning electron microscopy and thickness measurement were used to investigate the morphology and crystal structure of SnO_2 film. The results showed that the distance from nozzle to substrate, deposition time and the amount of mist of spray had the most influence on the film deposition. Location and heat treatment time also affect the particle size, uniformity and compactness.In addition, the results also show that the deposition time of SnO 2 film, after heat treatment, the crystal form has significantly improved.