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利用由127个株系组成的来源于籼稻品种窄叶青8号和粳稻品种京系17的加倍单倍体群体,以耐性指数和敏感性指数为指标,采用QTL Mapper 1.6统计软件进行水稻耐光氧化反应特性的QTL定位和上位性分析,共检测到控制耐性指数的1个加性效应QTL,位于第3染色体上;控制敏感性指数的加性效应QTL5个,分别位于第1、1、6、8和9染色体上。还检测到3对影响耐性指数的加性×加性上位性互作效应QTL和5对敏感性指数的上位性QTL。还对41个水稻材料进行了光氧化实验筛选。
Using doubled haploid population from 127 lines derived from Indica rice Variety Zayeiqing 8 and Japonica variety Jing 17, the tolerance index and sensitivity index were used as indexes to evaluate the photosynthetic rate QTL mapping and epistasis analysis of response traits detected one additive effect QTL controlling the tolerance index and located on chromosome 3. Five QTLs for controlling the additive effect of sensitivity index were located in the first, 8 and 9 chromosomes. Three pairs of additive Q additive additive epistatic QTLs and 5 sensitive additive QTLs were also detected. 41 rice materials were also screened by photooxidation.