在辉光放电中碳氟化合物存在聚合(polymerization)与刻蚀(ablation)两种相反的过程,两者竞争结果对聚合膜的淀积速率、结构和性能均有影响。一般认为,在辉光放电中,全氟烷烃以刻蚀为主;全氟烯烃以聚合为主。全氟环烷烃的氟碳比与全氟烯烃相同,但具有饱和性,兼有全氟烷烃与全氟烯烃的某些特性。对全氟环烷烃等离子体聚合与刻蚀的竞争历程研究尚 There are two opposite processes of fluorocarbon polymerization and ablation in the glow discharge, and the competition between them affects the deposition rate, structure and properties of the polymer film. Generally believed that in the glow discharge, perfluoroalkane etching mainly; perfluoroolefin to polymerization based. The perfluorocycloalkane has the same fluorocarbon to perfluoroolefin as the perfluoroolefin, but has the property of saturation with some characteristics of perfluoroalkanes and perfluoroolefins. Research on competition history of perfluorocycloalkane plasma polymerization and etching