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一种检测GaN基材料局域光学厚度均匀性的方法由中科院上海技术物理研究所上海蓝宝光电材料有限公司发明并获专利。该专利采用显微荧光光测量方法,将测得的数据进行处理获得振荡干涉谱,再对干涉谱进行干涉峰位线性拟合,进而得到材料的光学厚度,然后用常规的统计方法就可直接得到厚度不均匀性的分布特征。该方法可为材料生长工艺优化研究提供丰富的信息,特别在严重损害器件质量的局域非均匀性检测方面具有明显的意义。
A method for detecting local optical thickness uniformity of a GaN-based material was invented and patented by Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai Lanbao Photoelectric Material Co., Ltd. The patent uses the micro-fluorescence light measurement method, the measured data are processed to obtain the oscillation interference spectrum, and then interference spectrum peak interference fitting linearly, and then get the optical thickness of the material, and then using conventional statistical methods can be directly Get the thickness of non-uniform distribution. This method can provide abundant information for the optimization research of material growth process, especially for the detection of local nonuniformity, which seriously damages the quality of the device.