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通过数值计算及粒子模拟程序,分析了强流电子束阻抗、电压及电流特性对相对论速调管放大器(relativistic klystron amplifier,RKA)中束流调制、群聚特性的影响,其中粒子模拟程序中采用束发射方式以精确控制电子束的阻抗.结果表明,低阻抗电子束有利于减小群聚距离,缩短RKA器件的整体长度,不利于注入微波对电子束的调制,而高阻抗电子束情况正好相反.在电子束阻抗不变时,增加电子束加速电压类似于增大电子束阻抗的情况.另外,用粒子模拟方法确定了不同阻抗电子束对特定输入腔的电子负载电导,从而可以得到不同阻抗的强流电子束对种子源功率水平的需求以及对输入腔外观品质因数的要求.
The numerical simulation and particle simulation program are used to analyze the influence of the strong current electron beam impedance, voltage and current characteristics on the beam modulation and cluster characteristics in a relativistic klystron amplifier (RKA). Particle modeling Beam emission method to precisely control the electron beam impedance.The results show that the low impedance electron beam is conducive to reducing the cluster distance and shorten the overall length of the RKA device is not conducive to the injection of microwave electron beam modulation, In contrast, increasing electron beam accelerating voltage at a constant electron beam impedance is similar to increasing the electron beam impedance, and the electron-carrying conductances of different impedance electron beams to a particular input cavity are determined using a particle simulation method to obtain different Impedance of high current electron beam on the seed source power level requirements and input cavity appearance quality factor requirements.