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通过射频磁控溅射法制备了Fe_Si_B_Nb_Cu薄膜 ,采用x射线衍射与M ssbauer谱相结合分析了薄膜的微结构形态 ,研究了不同溅射功率对薄膜微结构的影响 .其结果表明 :在较低溅射功率密度下 ,薄膜为无定型结构 ;随着溅射功率密度升高 ,沉积薄膜无需热处理 ,便呈现出晶态和非晶态的混合相结构 ,晶态为纳米级的α_Fe(Si)和α_Fe(B)固溶体 ;α_Fe(Si)相和α_Fe(B)相的体积分数、微结构组态、磁矩取向及宏观磁性能均随着溅射功率的变化而变化
The thin films of Fe_Si_B_Nb_Cu were prepared by radio frequency magnetron sputtering and their microstructures were analyzed by X-ray diffraction and M ssbauer spectroscopy.The effects of different sputtering powers on the microstructures of the films were investigated.The results show that in the lower With the increase of sputtering power density, the deposited films showed a mixed phase structure of crystalline and amorphous phases without any heat treatment. The crystalline state was α-Fe (Si) And α_Fe (B) solid solution. The volume fraction, microstructure, magnetic orientation and macroscopic magnetic properties of α_Fe (Si) phase and α_Fe (B) phase both vary with the sputtering power