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作者在介绍真空镀膜的形态,膜与基片间的附着性能及其改进措施,膜晶粒大小与其硬度和机械性能间的关系,几种离子镀金属、合金和碳化物硬质镀层的性能以及镀敷工艺等内容的基础上,较为详细地论述了空心阴极离子镀(HCD)的基本概念和工艺特性。然后给出了HCD沉积、HCD反应沉积的铬、CrC、CrN、TiC、TiN等膜的镀敷条件和膜的表面形态、耐磨、耐蚀、硬度、组成等性能的试验结果以及膜的表征方法。最后对日本的工业离子镀设备和离子镀工艺在工具工业中的应用效果作了简要介绍。
The authors describe the morphology of the vacuum coating, the adhesion between the film and the substrate and its improvement, the relationship between the grain size of the film and its hardness and mechanical properties, the properties of several ion plating metals, alloys and carbide hard coatings, and Plating process and so on, the basic concept and process characteristics of Hollow Cathode Ion Plating (HCD) are discussed in detail. The experimental results of HCD deposition, HCD deposition of chromium, CrC, CrN, TiC, TiN and other films and the surface morphology, abrasion resistance, corrosion resistance, hardness and composition of the films and the characterization of the films method. Finally, the application effects of industrial ion plating equipment and ion plating technology in the tool industry in Japan are briefly introduced.