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5. A SMALL UNBALANCED MAGNETRON SPUTTERING SOURCE WITH MULTIPOLE MAGNETIC FIELD ANODE

A SMALL UNBALANCED MAGNETRON SPUTTERING SOURCE WITH MULTIPOLE MAGNETIC FIELD ANODE

来源 :核技术：英文版 | 被引量 : 0次 | 上传用户：gdzsmd

【摘 要】

：

A small unbalanced magnetron atom source with multipole cusp magnetic field anode is described.The co-axial magnetron rpinciple is extended to the circular plan

【作 者】

：

郑思孝 孙官清 等 

【机 构】

：

InstituteofNuclearScienceandTechnologySichuanUniversity,InstituteofNuclearScience

【出 处】

：

核技术：英文版

【发表日期】

：

1994年2期

【关键词】

：

薄膜生长 磁子溅射源 铝靶 Magnetron sputtering source Multipole field anode Aluminium target 

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A small unbalanced magnetron atom source with multipole cusp magnetic field anode is described.The co-axial magnetron rpinciple is extended to the circular planar magnetron atom source,which raises the efficiency of sputtering target area up to 60%.The mu

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