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注入剂量为２×１０１６，５×１０１６，１×１０１７／ｃｍ２的Ｃｅ＋，使Ｎｉ２０Ｃｒ合金在１０００和１１００℃下的氧化速率显著降低．氧化膜致密、完整、粘附性好．利用离子探针分析技术测量了注Ｃｅ＋后，合金元素在合金表面及１１００℃形成的氧化膜内结合能差．注Ｃｅ＋后降低了合金表面Ｃｒ＋的结合能，有利于其向外扩散从而快速成膜；增大了膜内Ｃｒ＋和Ｎｉ＋的结合能，对这些离子在膜内的扩散起阻碍作用．因此，Ｃｅ＋的注入能改善合金的抗氧化性能．此外，在１０００℃循环氧化２７０次后，氧化膜部分剥落，Ｃｅ改善合金抗氧化性能仍十分显著．
Implantation of Ce + at doses of 2 × 10 16, 5 × 10 16, 1 × 10 17 / cm 2 significantly reduced the oxidation rate of Ni20Cr alloy at 1000 and 1100 ° C. Oxide film is dense, complete, good adhesion. The ion-probe analysis technique was used to measure the bonding energy difference of alloying elements on the surface of the alloy and the oxide film formed at 1100 ℃ after the Ce + implantation. Ce + can reduce the binding energy of Cr + on the alloy surface, which is favorable for its outward diffusion and rapid film formation. It increases the binding energy of Cr + and Ni + in the film and hinders the diffusion of these ions in the film. Therefore, the injection of Ce + can improve the oxidation resistance of the alloy. In addition, after oxidation cycle at 1000 ℃ for 270 times, the oxide film partially peeled off and the oxidation resistance of Ce alloy was still very remarkable.