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采用表面机械研磨处理技术(Surface mechanical attrition treatment,SMAT)在工业纯Ti的表面制备出一层厚度约30μm纳米结构表层,最表层的平均晶粒尺寸约30nm。随后在常温(25℃)下对其进行双氧水及400℃煅烧处理,并采用X射线光电子能谱(XPS)等手段进行了逐层结构分析。结果表明,SMAT Ti表面与粗晶Ti表层形成的氧化层结构存在明显差别。
A surface layer of about 30μm in thickness was prepared on the surface of pure industrial Ti by surface mechanical attrition treatment (SMAT). The average grain size of the outermost layer was about 30nm. Subsequently, it was subjected to hydrogen peroxide and calcination at 400 ° C at room temperature (25 ° C), and the layer-by-layer structure was analyzed by X-ray photoelectron spectroscopy (XPS). The results show that there is a significant difference in the oxide layer structure between SMAT Ti surface and coarse grain Ti surface.